Drop impact on rigid substrate with controlled motion
ORAL
Abstract
We report a method to reduce the contact time of a droplet impacting on a solid substrate by controlling the substrate motion. This motion is sinusoidal and triggered by a detection of the moment of impact using a MEMS-based force sensor fabricated on the substrate. We show that substrate motion can reduce the contact time by ~50% for a flat superhydrophobic surface. The most efficient reduction of the contact time was reached when moving the substrate with a period similar to the spreading time of the droplet. Especially, combining substrate textures and its motion could lead to a reduction of approximately 80% of the contact time.
*The photolithography masks were made using the University of Tokyo VLSI Design and Education Center (VDEC)’s 8 inch EB writer F5112 + VD01 donated by ADVANTEST Corporation. This work was supported by JSPS KAKENHI Grant-in-Aid for Young Scientists (A) Grant Number 17H04903. The authors thank Professor David Quéré and Pierre Chantelot from Ecole Polytechnique for fruitful discussions.
–
Presenters
-
Thanh-Vinh Nguyen
- Univ of Tokyo