Impact of Current Profile on Transport and Stability in High Noninductive Fraction DIII-D Discharges

ORAL

Abstract

Experiments addressing the issue of $J_{BS}$ and $J_{EC}$ alignment and the optimum $q$ profile for stable noninductive operation show the $J_{NI}$ and $J$ profiles are best aligned at $q_{min}\sim 1.5$, $q_{95}\sim 6.8$. The kinetic profiles vary systematically with $q_{min}$ and $q_{95}$. Transport analysis shows that electrons dominate losses at low $q_{min}$, while at high $q_{min}$ ions dominate. Drift wave stability analysis with the TGLF model shows trends in the linear growth rates that contradict these observations. Systematic scans of EC deposition indicate that a broad ECCD profile at $\rho\sim 0.3-0.55$ yields a $J$ profile that is more stable to the tearing modes that limit the duration of the discharges. Optimal alignment of $J_{EC}$ for tearing stability coincides with the region where additional NI current is needed for $f_{NI}=1$.

*Work supported by US DOE under DE-AC05-06OR23100, DE-FC02-04ER54698, DE-AC52-07NA27344, DE-FC02-99ER54512, DE-AC02-09CH11466, \& DE-FG02-06ER84442.

Authors

  • F. Turco

    • ORAU
    • ORISE
  • T.C. Luce

    • General Atomics
  • J.R. Ferron

    • General Atomics
  • P.A. Politzer

    • General Atomics
    • GA
  • M.A. Van Zeeland

    • General Atomics
    • GA
  • S.P. Smith

  • A.M. Garofalo

    • General Atomics
  • Alan Turnbull

    • General Atomics
    • GA
  • C.T. Holcomb

    • LLNL
  • A.E. White

    • MIT-PSFC
  • M. Okabayashi

    • PPPL
    • Princeton Plasma Physics Laboratory
    • PPPL, Princeton, NJ
  • Y. In

    • FAR-TECH
    • FAR-Tech, Inc.
  • H. Reimerdes

    • Columbia University
    • Columbia U.
  • D.P. Brennan

  • R. Takahashi

    • U. Tulsa