High-voltage Sheath Dynamics of Grid Electrodes

The Plasma-immersed ion implantation (PIII) is a well-known technology to modify properties of material surfaces. The Pseudo-wave assisted PIII is one kind of PIII, which uses ions in pseudo-wave generated by high-voltage pulses applied to the grid electrodes. Since high-voltage electrodes do not contact film directly, the pseudo-wave PIII takes advantage in preventing arcing problems between electrodes and film. In the pseudo-wave assisted PIII, quantity and energy of implanted ions depend on characteristics of high-voltage sheath around the grid electrodes. Thus, to characterize the implanted ions in the pseudo-wave assisted PIII, we have to understand the dynamics of high-voltage sheath of grid electrodes. In this paper, we present the PIC simulation and experimental results about high-voltage sheath dynamics of grid electrodes. In addition, we present the simple model about high-voltage sheath dynamics of grid electrodes and compare with simulation and experimental results.