New ICRF antenna Characterization and Performance in EAST

ORAL

Abstract

Coupling and Heating associated with ion cyclotron range of frequency (ICRF) heating was a major challenge to ICRF utilization in the past on EAST. In order to increase the antenna loading and thereby increase the heating, a lower k parallel spectrum ICRF antenna has been designed and installed for EAST 2021 experimental campaign. In order to decrease the maximum voltage on the transmission line, we developed an impedance transformer near the antenna port. The new antenna with 3D curved Faraday screens and current strap is also expected to improve further the coupling. Using the old B-port antenna as a reference, the coupling and heating efficiency are significantly higher for the new antenna than the old B-port antenna. The coupling loading and heating efficiency of the new ICRF antenna is ∼3-7 times greater than the old B-port antenna. The plasma stored energy is increased by 30 kJ/MW in the high βH-mode discharges . The improved performance is consistent with simulations indicating that the new design of ICRF antenna has greatly improved the coupling relative to the old antennas. In addition, the long pulse operations of 1.1MW/60s, 1.5MW/40s and 1.8MW/22s are achieved for the new ICRF antenna in the high βH-mode discharges. Here, we will report results on the coupling characterization of new ICRF antenna and an overview of the main results from new ICRF antenna in the EAST 2021 experimental campaign. 

*This work was supported by (1) the National Key Research and Development Program (Grant Nos. 2016YFA0400600 and 2016YFA0400601);2)Tthe Comprehensive Research Facility for Fusion Technology Program of China under Contract No. 2018-000052-73-01-001228;3)the National Natural Science Foun- dation of China (Grant Nos. 11975265);4)National MCF energy R&D program(2019YFE03070000 and 2019YFE03070001).

Presenters

  • Xinjun Zhang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

Authors

  • Xinjun Zhang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
  • Chengming Qin

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
  • Shuai Yuan

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Hua Yang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Yongsheng Wang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Yuzhou Mao

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Lunan Liu

    • Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China
  • Lei Wang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Yanping Zhao

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Xianzu Gong

    • ASIPP
    • Institute of Plasma Physics, Chinese Academy of Sciences
    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
    • Institute of plasma physics, Chinese Academy of Sciences
  • Yan Cheng

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Xu Deng

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Kai Zhang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Songqing Ju

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Jianggang Li

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Baonian Wan

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
    • Institute of Plasma Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China
  • Yuntao Song

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Wei Zhang

    • Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
  • Lin Ai

    • University of Science and Technology of China, Hefei 230026, People's Republic of China
  • Qichao Liang

    • University of Science and Technology of China, Hefei 230026, People's Republic of China
  • Guanghui Zhu

    • Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China