New ICRF antenna Characterization and Performance in EAST
ORAL
Abstract
Coupling and Heating associated with ion cyclotron range of frequency (ICRF) heating was a major challenge to ICRF utilization in the past on EAST. In order to increase the antenna loading and thereby increase the heating, a lower k parallel spectrum ICRF antenna has been designed and installed for EAST 2021 experimental campaign. In order to decrease the maximum voltage on the transmission line, we developed an impedance transformer near the antenna port. The new antenna with 3D curved Faraday screens and current strap is also expected to improve further the coupling. Using the old B-port antenna as a reference, the coupling and heating efficiency are significantly higher for the new antenna than the old B-port antenna. The coupling loading and heating efficiency of the new ICRF antenna is ∼3-7 times greater than the old B-port antenna. The plasma stored energy is increased by 30 kJ/MW in the high βp H-mode discharges . The improved performance is consistent with simulations indicating that the new design of ICRF antenna has greatly improved the coupling relative to the old antennas. In addition, the long pulse operations of 1.1MW/60s, 1.5MW/40s and 1.8MW/22s are achieved for the new ICRF antenna in the high βp H-mode discharges. Here, we will report results on the coupling characterization of new ICRF antenna and an overview of the main results from new ICRF antenna in the EAST 2021 experimental campaign.
*This work was supported by (1) the National Key Research and Development Program (Grant Nos. 2016YFA0400600 and 2016YFA0400601);2)Tthe Comprehensive Research Facility for Fusion Technology Program of China under Contract No. 2018-000052-73-01-001228;3)the National Natural Science Foun- dation of China (Grant Nos. 11975265);4)National MCF energy R&D program(2019YFE03070000 and 2019YFE03070001).
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Presenters
Xinjun Zhang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
Authors
Xinjun Zhang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
Chengming Qin
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
Shuai Yuan
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Hua Yang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Yongsheng Wang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Yuzhou Mao
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Lunan Liu
Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China
Lei Wang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Yanping Zhao
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Xianzu Gong
ASIPP
Institute of Plasma Physics, Chinese Academy of Sciences
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Institute of plasma physics, Chinese Academy of Sciences
Yan Cheng
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Xu Deng
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Kai Zhang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Songqing Ju
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Jianggang Li
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Baonian Wan
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Institute of Plasma Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China
Yuntao Song
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Wei Zhang
Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China
Lin Ai
University of Science and Technology of China, Hefei 230026, People's Republic of China
Qichao Liang
University of Science and Technology of China, Hefei 230026, People's Republic of China
Guanghui Zhu
Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China