Laser ion implantation into Si and Diamond for Superconductivity and Quantum information applications
ORAL
Abstract
We report on the use of PW to TW laser-driven ion beams to implant various elements including boron and hydrocarbons into silicon and diamond for superconductivity and quantum telecommunication applications. We observe boron concentrations up to ~1.4x1022/cm3 when boron ions from a PW laser-driven ion pulse were implanted into silicon, corresponding to a fluence of ~1016 boron ions/cm2/shot. Time-resolved current measurements with 100 TW class laser shots show a very intense plasma expansion pulse of low energy ions (<1 keV) that trails the pulse of high energy ions from target normal sheath acceleration. Color centers, including qubit candidates such as G-centers in silicon, form directly under these conditions of intense (dual)-ion pulse irradiation and laser-ion doping. Very high boron concentrations can increase the transition temperature for superconductivity (from ~0.5 K in silicon and ~7 K in diamond) and we will report results from temperature dependent resistivity studies together with results from color center characterization.
*This work at Berkeley Lab was supported by the Office of Science, Office of Fusion Energy Sciences, of the U.S. DOE, Contract No. DE-AC02-05CH11231.The results reported here are based on an experiment performed at PHELIX facility, GSI, Germany.
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Presenters
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Kaushalya Jhuria
- Lawrence Berkeley National Laboratory
- ATAP, Lawrence Berkeley National Lab