SparkLight: PPPL's EUV Source for Next-Gen Microelectronics

POSTER

Abstract

At PPPL, a combination of modeling and experiment is being pursued in order to increase our understanding of the plasma physics which serves as the basis for tin-based extreme ultraviolet (EUV) lithography sources. Particle-in-cell simulations show the importance of kinetic effects for energetic ion damage, while radiation hydrodynamic simulations demonstrate how pulse-shaping could improve laser to EUV conversion efficiency. Experimentally, a combination of interferometry, spectroscopy, and Thomson scattering serve as the basis for providing a robust cross-validation capability. Validating experimental diagnostics against each other and simulations is currently underway to produce an accurate understanding of the plasma dynamics.

*This work was supported by the Laboratory Directed Research and Development (LDRD) Program at Princeton Plasma Physics Laboratory, operated by Princeton University for the U.S. Department of Energy under Prime Contract No. DE-AC02-09CH11466.

Presenters

  • Alec Griffith

    • Princeton University

Authors

  • Alec Griffith

    • Princeton University

  • Anatoli Vladimirovich Morozov

    • Princeton University

  • Kirill Lezhnin

    • Princeton Plasma Physics Laboratory (PPPL)

  • Stanislav Mushkin

    • Princeton Plasma Physics Laboratory

  • Shurik Yatom

    • Princeton Plasma Physics Laboratory (PPPL)

  • William R Fox

    • University of Maryland, College Park
    • University of Maryland

  • Ahmed Diallo

    • Princeton Plasma Physics Laboratory (PPPL)