Adsorbate-Induced Resistivity Changes by Diethyl Disulfide on Sputtered Au(111)

We measured the maximum adsorbate-induced fractional change in resistivity on 150 nm thick Au(111) films caused by diethyl disulfide chemisorption. This was done at a base pressure of 4.0 x 10^-10 Torr with a four-probe lock-in measurement across the sample. Auger spectroscopy was used to analyze the surface of the sample before and after dosing. Our results show an average increase of 1.159% ± 0.079% on samples that were sputtered or sputtered and annealed.