Lighting and Lasers
FOCUS · PW1
Presentations
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High Power Extreme Ultra-Violet (EUV) Light Sources for Future Lithography
COFFEE_KLATCH · Invited
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Authors
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Jeroen Jonkers
Philips EUV, Steinbachstrasse 15, 52074 Aachen, Germany
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Excitation of O$_{2}(^{1}\Delta )$ in Pulsed Radio Frequency Flowing Plasmas for Chemical Oxygen Iodine Lasers
ORAL
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Authors
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Natalia Babaeva
Iowa State University
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Ramesh Arakoni
University of Illinois
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Mark J. Kushner
Iowa State University
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Plasma Kinetics of High Power Overtone Carbon Monoxide Lasers
ORAL
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Authors
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Yurii Utkin
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Matthew Goshe
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Igor Adamovich
Ohio State University
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Walter Lempert
Ohio State University
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J.William Rich
Ohio State University
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Color Rendering and Power Factor Trade-offs in Rare Earth Containing Ceramic Discharge Metal Halide Lamps
ORAL
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Authors
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Ray Gibson
Philips Lighting Company
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Model Study of Breakdown in Long Tubes
ORAL
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Authors
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W.J.M. Brok
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J.J.A.M. van der Mullen
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G.M.W. Kroesen
Eindhoven University of Technology, The Netherlands, Eindhoven University of Technology
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