Magnetic field measurements for N$_{2}$ and H$_{2}$ discharges from a low frequency RF inductively coupled plasma source

The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N$_{2}$ and H$_{2}$ gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a higher degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is shown.