The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)

The time evolution of the electron density and electron temperature in a high power impulse magnetron sputtering discharge (HiPIMS) are explored with a Langmuir probe. A high-density plasma is created by applying a high power pulse with short duty cycle and low repetition frequency to a planar magnetron discharge [1]. The electron density in a HiPIMS discharge is very high $\sim 10^{19}$ m$^{-3}$ in the substrate vicinity [2,3] and remains high for a while after the pulse is off. The electron energy distribution function (EEDF) in the substrate vicinity during and shortly after the pulse can be represented by a bi-Maxwellian like distribution indicating two energy groups of electrons. Here the time evolution of the two electron groups is monitored. \newline \newline [1] U. Helmersson, M. Lattemann, J. Bohlmark, A.P. Ehiasarian, and J.T. Gudmundsson, Thin Solid Films 513, 1 (2006) \newline [2] J. T. Gudmundsson, J. Alami, and U. Helmersson, Appl. Phys. Lett. 78, 3427 (2001) \newline [3] J. Bohlmark, J. T. Gudmundsson, J. Alami, M. Lattemann, and U. Helmersson, IEEE Trans. Plasma Sci. 33, 346 (2005)