The effect of the ion-enhanced field emission on the $CF_4$ discharges in microgaps

Recently, much attention has been paid to studies on $CF_4$ due to its practical utility as a feed gas for plasma etching in the semiconductor industry. In order to reduced feature sizes on microelectronic devices, it is necessary to determine the breakdown voltage in microgaps. In this paper, semi-empirical expression for the breakdown voltage based on the numerical solutions of the equation that describes the DC breakdown criteria in $CF_4$ microdischarges has been suggested.