Cross sections for electron scattering from the CF$_{3}$ radical

Electron interaction cross sections with fluorocarbon radicals, such as CF, CF$_{2}$ and CF$_{3}$, are a key data need for modeling industrial plasmas used to manufacture semiconductor devices. Here measurements of low-energy electron scattering cross sections for the CF$_{3}$ radical are presented. The gas target was prepared by thermal dissociation of a CF$_{3}$I precursor forming a gas mixture containing, amongst other products, CF$_{3}$. Time-of-flight analysis was used to characterize the gas mixture and, subsequently, the elastic differential cross sections for CF$_{3}$ were measured for energies between 5 -- 50 eV. The measured data are compared with new Schwinger Multichannel calculations.