Process Diagnostics and Monitoring Using the Multipole Resonance Probe (MRP)

In this contribution we present the application of the MRP in an industrial plasma ion assisted deposition (PIAD) chamber (Leybold optics SYRUS-pro). The MRP is a novel plasma diagnostic which is suitable for an industrial environment - which means that the proposed method is robust, calibration free, and economical, and can be used for ideal and reactive plasmas alike [1]. In order to employ the MRP as \emph{process diagnostics} we mounted the probe on a manipulator to obtain spatially resolved information on the electron density and temperature. As \emph{monitoring tool} the MRP is installed at a fixed position. Even during the deposition process it provides stable measurement results while other diagnostic methods, e.g. the Langmuir probe, may suffer from dielectric coatings.\\[4pt] [1] Lapke et. al., Appl. Phys. Lett. {\bf 93}, 051502 (2008)