Plasma Etching II

Presentations

• Physics and chemistry of complex oxide etching and redeposition control

  COFFEE_KLATCH · Invited

  Oct. 25, 2012, 4:30 PM – Oct. 25, 2012, 5:00 PM

  Authors

  • Jo\"elle Margot

    Physics department, Universit\'e de Montr\'eal

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• A complete simulation of InP etching by Cl2/N2/Ar plasma mixture

  ORAL

  Oct. 25, 2012, 5:00 PM – Oct. 25, 2012, 5:15 PM

  Authors

  • Romain Chanson

    Institut des Materiaux (IMN) - University of Nantes

  • Ahmed Rhallabi

    Institut des Materiaux (IMN) - University of Nantes, Institut des Materiaux Jean Rouxel - University of Nantes

  • Marie Claude Fernandez

    Institut des Materiaux (IMN) - University of Nantes, Institut des Materiaux Jean Rouxel - University of Nantes

  • Christophe Cardinaud

    Institut des Materiaux (IMN) - University of Nantes

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• Plasma induced UV/VUV damage during Si and GaN device fabrication

  COFFEE_KLATCH · Invited

  Oct. 25, 2012, 5:15 PM – Oct. 25, 2012, 5:45 PM

  Authors

  • Tetsuya Tatsumi

    Sony Corporation

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• Role of Photons, Ion Implantation and Mixing in Sub-threshold Selective Etching of Si

  ORAL

  Oct. 25, 2012, 5:45 PM – Oct. 25, 2012, 6:00 PM

  Authors

  • Juline Shoeb

    Lam Research Corporation, Fremont, CA

  • Saravanapriyan Sriraman

    Lam Research Corporation, Fremont, CA

  • Tom Kamp

    Lam Research Corporation, Fremont, CA

  • Alex Paterson

    Lam Research Corporation, Fremont, CA

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• Plasma damage and restoration of a spin-on organic ultra low-k material (k=2.3)

  ORAL

  Oct. 25, 2012, 6:00 PM – Oct. 25, 2012, 6:15 PM

  Authors

  • Mikolaj Lukaszewicz

    Wroclaw University

  • Jean-Francois de Marneffe

    Imec v.z.w.

  • Christopher J. Wilson

    Imec v.z.w.

  • Liping Zhang

    Imec v.z.w.

  • Christopher J. Wilson

    Imec v.z.w.

  • Patrick Verdonck

    Imec v.z.w.

  • Mikhail Baklanov

    Imec v.z.w.

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• Controlling Ion and UV/VUV Photon Fluxes in Pulsed Low Pressure Plasmas for Materials Processing

  ORAL

  Oct. 25, 2012, 6:15 PM – Oct. 25, 2012, 6:30 PM

  Authors

  • Peng Tian

    University of Michigan

  • Mark J. Kushner

    University of Michigan

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