Advanced RF Systems for Plasma Control
FOCUS · AM1
Presentations
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Introduction
COFFEE_KLATCH
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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Time-Modulated Inductively Coupled Plasmas for Advanced Dry Etching Processes
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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The Electrical Asymmetry Effect in capacitive RF plasmas: Past, Present, and Future
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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Break
COFFEE_KLATCH
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Control of Ion Energy Distributions Through the Phase Difference Between Multiple Frequencies in Capacitively
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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EEDf, IEDf and some of the physics of the Non-ambipolar Electron Plasma (NEP)
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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Lunch
COFFEE_KLATCH
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Centralized and Coherent Feedforward Impedance Tuning Control and Feedback Power Regulation for the Enhancement of RF Plasma Processing Systems
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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Inductively Coupled Plasma Sources for Dry Etching and Annealing Processes
Invited
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Authors
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David Coumou
Applied Materials, University of Notre Dame; Air Force Research Laboratory, Princeton University, The Ohio State University, The Ohio State University, Columbus,, Panasonic, ENI Products, MKS Instruments, Inc, Tokyo Electron America, Inc., University of Michigan, West Virginia University ; Hungarian Academy of Sciences, Applied Materials Inc.
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Panel Discussion
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