Experimental investigation of plasma parameter profiles on wafer level with discharge gap lengths in an inductively coupled plasma

Experimental investigation of the gap length effect on plasma parameters was performed in a planar type inductively coupled plasma (ICP) at various conditions. The spatial profile (wafer level, 260 mm) of ion flux, and electron temperature were measured from a 2-D floating probe measurement system. At low pressures, the spatial profile of the ion flux rarely changed; however, at relatively high pressures, the spatial profile of the ion flux dramatically changed with different discharge gap length.