Effects of Plasma Formation on the Cesium Diode (DPAL) and Excimer (XPAL) Pumped Alkali Laser
POSTER
Abstract
Diode pumped alkali lasers (DPALs) and excimer pumped alkali lasers (XPALs) are being investigated as a means to convert optical pumps having poor optical quality to laser radiation having high optical quality [1]. DPALs sustained in Cs vapor are pumped on the D$_{\mathrm{2}}$(852.35 nm), Cs(6$^{\mathrm{2}}$S$_{\mathrm{1/2}})\to $ Cs(6$^{\mathrm{2}}$P$_{\mathrm{3/2}})$, transition and lase on the D$_{\mathrm{1}}$(894.59 nm) transition, Cs(6$^{\mathrm{2}}$P$_{\mathrm{1/2}})\to $ Cs(6$^{\mathrm{2}}$S$_{\mathrm{1/2}})$. Collisional mixing (spin orbit relaxation) of the Cs(6$^{\mathrm{2}}$P$_{\mathrm{3/2}})$ and Cs(6$^{\mathrm{2}}$P$_{\mathrm{1/2}})$ levels is a key part of this three-level (in fact, a quasi-two-level) laser scheme. In the five-level XPAL pumping scheme, the CsAr(B$^{\mathrm{2}}\Sigma ^{\mathrm{+}}_{\mathrm{1/2}})$ state is optically pumped by 836.7 nm pulses, which later dissociates and produces Cs(6$^{\mathrm{2}}$P$_{\mathrm{3/2}})$. As in DPAL, a collisional relaxant transfers the population of Cs(6$^{\mathrm{2}}$P$_{\mathrm{3/2}})$ to Cs(6$^{\mathrm{2}}$P$_{\mathrm{1/2}})$, which enables lasing on D$_{\mathrm{1}}$ transition. A first principals global computer model has been developed for both systems to investigate the effects of plasma formation on the laser performance. Argon is used as a buffer gas and nitrogen or ethane are used as a collisional relaxant at total pressure of 600 Torr at temperatures of 350-450 K, which produces vapor pressures of Cs of \textless 0.1 Torr. In both systems, a plasma formation in excess of 10$^{\mathrm{14}}$ - 10$^{\mathrm{16\thinspace \thinspace }}$cm$^{\mathrm{-3}}$ occurs, which potentially reduces laser output power by electron collisional mixing of upper and lower laser levels [2]. [1] W.F. Krupke, et. al., Opt. Lett. \textbf{28} 2336 (2003). [2] B.D. Barmashenko, et. al. Opt. Comm. \textbf{292}, 123 (2013).
Authors
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Aram H. Markosyan
U. Michigan, University of Michigan
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Mark J. Kushner
University of Michigan, U. Michigan, University of Michigan EECE