Modeling and Simulation II

Presentations

• Computational Modeling of Ion Energy and Angular Distributions in Pulsed Source and Bias Plasmas

  ORAL

  Oct. 30, 2019, 8:00 AM – Oct. 30, 2019, 8:15 AM

  Authors

  • Rochan Upadhyay

    • Esgee Technologies Inc.

  • Kenta Suzuki

    • Esgee Technologies Inc.

  • Peter Ventzek

    • Tokyo Electron America

  • Laxminarayan L. Raja

    • University of Texas at Austin
    • The University of Texas at Austin

  • Alok Ranjan

    • Tokyo Electron Miyagi

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• Simulations of sheath-wave interactions controlling low frequency modulation of uniformity in VHF driven plasma sources

  ORAL

  Oct. 30, 2019, 8:15 AM – Oct. 30, 2019, 8:30 AM

  Authors

  • Toshihiko Iwao

    • Tokyo Electron Technology Solutions Limited

  • Peter Ventzek

    • Tokyo Electron America, Inc.

  • Jianping Zhao

    • Tokyo Electron America, Inc.

  • Rochan Upadhyay

    • Esgee Technologies Inc.

  • Laxminarayan Raja

    • The University of Texas at Austin

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• Computational Optimization of Plasma Chemistry by Reducing Chemical Species and Reactions in Plasma Models

  ORAL

  Oct. 30, 2019, 8:30 AM – Oct. 30, 2019, 8:45 AM

  Authors

  • Sathya Ganta

    • Applied Materials, Inc.

  • Xiaopu Li

    • Applied Materials Inc
    • Applied Materials, Inc.

  • Kallol Bera

    • Applied Materials, Inc.

  • Shahid Rauf

    • Applied Materials, Inc.

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• RF Hollow Cathode Discharge Simulation using Electron Monte Carlo - Fluid Plasma Model

  ORAL

  Oct. 30, 2019, 8:45 AM – Oct. 30, 2019, 9:00 AM

  Authors

  • Kallol Bera

    • Applied Materials, Inc.

  • Shahid Rauf

    • Applied Materials, Inc.

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• Hybrid three-dimensional electromagnetic and plasma simulation

  COFFEE_KLATCH · Invited

  Oct. 30, 2019, 9:00 AM – Oct. 30, 2019, 9:30 AM

  Authors

  • Edward Hammond

    • Applied Materials Inc

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