Plasma Etching

Presentations

• Advancements in Feature Scale Simulations

  COFFEE_KLATCH · Invited

  Oct. 9, 2020, 10:45 AM – Oct. 9, 2020, 11:15 AM

  Authors

  • Paul Moroz

    TEL Technology Center, America, LLC

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• Optimization of Etching Recipes for Si Trenches with Self-Aligned Quadruple Patterning Mask by Transfer Learning

  ORAL

  Oct. 9, 2020, 11:15 AM – Oct. 9, 2020, 11:30 AM

  Authors

  • Naoto Takano

    Hitachi, Ltd. Research & Development Group

  • Hyakka Nakada

    Hitachi, Ltd. Research & Development Group

  • Takeshi Omori

    Hitachi, Ltd. Research & Development Group

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• Quantum Tunneling with Space Charge Effects in Thin Insulating Gaps.

  ORAL

  Oct. 9, 2020, 11:30 AM – Oct. 9, 2020, 11:45 AM

  Authors

  • Sneha Banerjee

    ECE, Michigan State University, 48824, USA

  • Peng Zhang

    ECE, Michigan State University, 48824, USA, Michigan State University, ECE, Michigan State University

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• Dynamics of physicochemical reactions in time-modulation of plasmas for advanced semiconductor processes

  COFFEE_KLATCH · Invited

  Oct. 9, 2020, 11:45 AM – Oct. 9, 2020, 12:15 PM

  Authors

  • Masaru Hori

    Nagoya Univ, Center for Low-temperature Plasma Sciences, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8601 Japan, Nagoya University, Nagoya, 464-8601, Japan, Nagoya University

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