Plasma Applications

FOCUS · TF12 · ID: 14059

Presentations

  • Microplasma-Driven Atomic Layer Deposition of Aluminum Oxide Etch-Free Patterning, and Gallium Oxide-Based Flexible DUV Photodetector

    ORAL

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    Presenters

    • Jinhong Kim

      University of Illinois at Urbana-Champai

    Authors

    • Jinhong Kim

      University of Illinois at Urbana-Champai

    • Dane J Sievers

      University of Illinois Urbana Champaign

    • Sung-Jin Park

      University of Illinois, Eden Park Illumination, University of Illinois at Urbana-Champai, University of Illinois

    • J. Gary Eden

      University of Illinois at Urbana-Champaign

    View abstract →

  • Optimizing the deposition rate and ionized flux fraction of a high power impulse magnetron sputtering discharge

    ORAL · Invited

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    Publication: M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini,J. T. Gudmundsson, A. Anders, and D. Lundin, Plasma Sources Science and Technology 29, 05LT01 (2020).
    N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A.Raadu, J. T. Gudmundsson, T. Minea, and D. Lundin, Journal of Vacuum Science and Technology A38, 033008 (2020).
    N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, Plasma Sources Science and Technology 30, 015015 (2021).

    Presenters

    • Martin Rudolph

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    Authors

    • Martin Rudolph

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    • Nils Brenning

      KTH Royal Institute of Technology, Stockholm, Sweden

    • Hamidreza Hajihoseini

      Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

    • Michael A Raadu

      KTH Royal Institute of Technology, Stockholm, Sweden

    • Tiberiu M Minea

      Laboratoire de Physique des Gaz et Plasmas, UMR 8578 CNRS, Université Paris–Saclay, Orsay, France, Paris Saclay University, LPGP, CNRS

    • Andre Anders

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    • Jon T Gudmundsson

      Science Institute, University of Iceland, Reykjavik, Iceland, Univ of Iceland

    • Daniel Lundin

      Plasma and Coatings Physics Division, Linköping University, Linköping, Sweden

    View abstract →

  • Plasma Ion Doping for Semiconductor Applications

    ORAL

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    Presenters

    • Hongwen Yan

      IBM TJ Watson Research Center

    Authors

    • Hongwen Yan

      IBM TJ Watson Research Center

    • Hiro Miyazoe

      IBM Research, T.J. Watson Research Center

    • Marinus Hopstaken

      IBM Research, T.J. Watson Research Center

    • Sebastian Engelmann

      IBM Research, T.J. Watson Research Center

    • Takashi Ando

      IBM Research, T.J. Watson Research Center

    • Kevin Chan

      na

    View abstract →

  • Water Interacting with Nanostructured Plasma Polymer Films

    ORAL

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    Publication: E. Bülbül, D. Hegemann, K. Ataka, S. Lehner, J. Heberle, M. Heuberger, Surf. Interfaces 23, 2021, 100922
    D. Hegemann, E. Bülbül, B. Hanselmann, U. Schütz, M. Amberg, S. Gaiser, Plasma Process. Polym. 18, 2021, e2000176

    Presenters

    • Dirk Hegemann

      Empa, Swiss Federal Laboratory for Mater

    Authors

    • Dirk Hegemann

      Empa, Swiss Federal Laboratory for Mater

    View abstract →

  • Plasma enhanced chemical vapour depositon of ZrO<sub>2</sub> based layers

    ORAL

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    Presenters

    • Philipp A Maaß

      Ruhr-University Bochum, Ruhr-University bochum

    Authors

    • Philipp A Maaß

      Ruhr-University Bochum, Ruhr-University bochum

    • Vitali Bedarev

      Ruhr-University Bochum

    • Sebastian M. J Beer

      Ruhr-University Bochum

    • Marina Prenzel

      Ruhr-University Bochum

    • Marc Böke

      Ruhr-University Bochum, Experimental Physics II, Faculty of Physics and Astronomy, Ruhr-University Bochum, Germany, 1Ruhr-University Bochum, Experimental Physics II, RUB Physik EPII; CRC 1316

    • Anjana Devi

      Ruhr-University Bochum

    • Achim von Keudell

      Ruhr-University Bochum, Experimental Physics II, Bochum

    View abstract →