Workshop I: Industrial Plasma Technologies

Presentations

• Modeling and Simulation of Plasmas for Etch Applications

  ORAL · Invited

  Oct. 2, 2022, 9:30 PM – Oct. 2, 2022, 10:15 PM

  Presenters

  • Jason Kenney

    Applied Materials Inc

  Authors

  • Jason Kenney

    Applied Materials Inc

  • Shahid Rauf

    Applied Materials Inc, USA, Applied Materials Inc, Applied Materials, Applied Materials Inc.

  • Samaneh Sadighi

    Applied Materials

  • Peng Tian

    Applied Materials Inc, USA, Applied Materials Inc., Applied Materials Inc

  • Han Luo

    Applied Materials Inc

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• Thermal cyclic atomic-level etching in 3D ULSI device fabrication

  ORAL · Invited

  Oct. 2, 2022, 10:15 PM – Oct. 2, 2022, 11:00 PM

  Presenters

  • Hiroto Ohtake

    Hitachi High-Tech Corporation

  Authors

  • Hiroto Ohtake

    Hitachi High-Tech Corporation

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• Lunch

  COFFEE_KLATCH · Invited

  Oct. 2, 2022, 11:00 PM – Oct. 3, 2022, 12:30 AM

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• New challenges on semiconductor plasma manufacturing processes

  ORAL · Invited

  Oct. 3, 2022, 12:30 AM – Oct. 3, 2022, 1:15 AM

  Presenters

  • Tsuyoshi Moriya

    Tokyo Electron Limited

  Authors

  • Tsuyoshi Moriya

    Tokyo Electron Limited

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• Applications of plasma-enhanced deposition technologies in the semiconductor industry

  ORAL · Invited

  Oct. 3, 2022, 1:15 AM – Oct. 3, 2022, 2:00 AM

  Presenters

  • Jaeho Kim

    SAMSUNG ELECTRONICS Co., Ltd.

  Authors

  • Jaeho Kim

    SAMSUNG ELECTRONICS Co., Ltd.

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• Coffee Break

  COFFEE_KLATCH · Invited

  Oct. 3, 2022, 2:00 AM – Oct. 3, 2022, 2:30 AM

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• Quantitative Control of Plasma and Surface Reactions for Dielectric Film Etching

  ORAL · Invited

  Oct. 3, 2022, 2:30 AM – Oct. 3, 2022, 3:15 AM

  Publication: [1] T. Tatsumi, et al., Jpn. J. Appl. Phys. 37, 2394 (1998).
  [2] T. Tatsumi, et al., J. Vac. Sci. Technol. A23, 938 (2005).
  [3] T. Kimura, et al., J. Vac. Sci. Technol. A23, 1068 (2007).
  [4] Y. Nakamura., et al., J. Vac. Sci. Technol. A25, 1062 (2007).
  [5] T. Tatsumi, Jpn. J. Appl. Phys. 61, SA0804 (2022).

  Presenters

  • Tetsuya Tatsumi

    Sony Semiconductor Solutions Corporation

  Authors

  • Tetsuya Tatsumi

    Sony Semiconductor Solutions Corporation

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• Plasma for a clean and carbon-neutral world

  ORAL · Invited

  Oct. 3, 2022, 3:15 AM – Oct. 3, 2022, 4:00 AM

  Presenters

  • Dae Hoon Lee

    Korea Institute of Machinery and Materials

  Authors

  • Dae Hoon Lee

    Korea Institute of Machinery and Materials

  • Hongjae Kang

    Korea Institute of Machinery and Materials

  • Youna Kim

    Korea Institute of Machinery and Materials

  • Heesoo Lee

    Korea Institute of Machinery and Materials

  • Hohyun Song

    Korea Institute of Machinery and Materials

  • Jeongan Choi

    Korea Institute of Machinery and Materials

  • Kwan-Tae Kim

    Korea Institute of Machinery and Materials

  • Young-Hoon Song

    Korea Institute of Machinery and Materials

  View abstract →