Probe Diagnostics

FOCUS · IF3 · ID: 546620

Presentations

  • A novel approach for calculating the plasma resonance behavior excited by wall-integrated planar diagnostic probes with arbitrary geometry

    ORAL

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    Publication: [1] The multipole resonance probe: characterization of a prototype ,M. Lapke et al., Plasma
    Sources Sci. Technol. 20, 042001 (2011).
    [2] Plasma Resonance in a Radio-Frequency Probe,K. Takayama, H. Ikegami, und S. Miyazaki,
    Phys. Rev. Let. 5, 238 (1960).
    [3] High-Frequency Dielectric Resonance Probe for the Measurement of Plasma Densities,A. M.
    Messiaen and P. E. Vandenplas, J. Appl. Phys. 37, 1718 (1966)
    [4] RF Admittance Measurements of a Slotted-Sphere Antenna Immersed in a Plasma,J. A. Waletzko
    and G. Bekefi, Radio Sci. 2, 489 (1967).
    [5] The impedance of a dipole antenna in the ionosphere: 1. Experimental study,N. Vernet, R.
    Manning, and J. L. Steinberg, Radio Sci. 10, 517 (1975).
    [6] Measurement of absolute electron density with a plasma impedance probe ,D. D. Blackwell,
    D. N. Walker, and W. E. Amatucci, Rev. Sci. Instrum 76, 023503 (2005).
    [7] Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with
    Processing Plasmas,H. Kokura, K. Nakamura, I.P. Ghanashev, and H. Sugai, Japan. J. Appl.
    Phys 38, 5262 (1999).
    [8] Practical implementation of a two-hemisphere plasma absorption probe ,C. Scharwitz, M.
    Böke, J. Winter, M. Lapke, T. Mussenbrock, and R. P. Brinkmann, Appl. Phys. Lett. 94,
    011502 (2009).
    [9] The multipole resonance probe: A concept for simultaneous determination of plasma density,
    electron temperature, and collision rate in low-pressure plasmas ,M. Lapke, T. Mussenbrock,
    and R. P. Brinkmann, Appl. Phys. Lett. 93, 051502 (2008).
    [10] Interaction of an antenna with a hot plasma and the theory of resonance probes ,J. A. Fejer,
    Radio Sci. 68D, 1171 (1964)
    [11] THE BEHAVIOR OF THE RESONANCE PROBE IN A PLASMA ,R. S. Harp, Appl. Phys.
    Lett. 4, 186 (1964)
    [12] Characteristics of the Plasma Resonance Probe ,R. S. Harp and F. W. Crawford, J. Appl.
    Phys. 35, 3436 (1964)
    [13] Characteristics of Resonance Probes ,T. Dote and T. Ichimiya, J. Appl. Phys. 36, 1866 (1965).
    [14] An Investigation of Boundary Theories for the Resonance Probe ,R. J. Kostelnicek, Radio
    Sci. 3, 319 (1968).
    [15] Linear and Nonlinear Response of a Plasma Sheath to Radio Frequency Potentials ,A. J.
    Cohen and G. Bekefi, Phys. Fluids 14, 1512 (1971).
    [16] The impedance characteristic of a spherical probe in an isotropic plasma ,J. Tarstrup and W.
    J. Heikkila, Radio Sci. 4, 493 (1972).
    [17] Impedance of an ion-sheathed spherical probe in a warm, isotropic plasma ,T. Aso, Radio Sci.
    8, 139 (1973).
    [18] Radio-Frequency Probes in a Nonlinear Isotropic Plasma ,C. C. Bantin and K. G. Balmain,
    Can. J. Phys. 52, 291 (1974).
    [19] A novel technique for plasma density measurement using surface-wave transmission spectra
    ,S. Dine, J.P. Booth, G.A Curley, C.S. Corr, J. Jolly, and J. Guillon, Plasma Scources Sci.
    Technol. 14, 777 (2005).
    [20] On collisionless energy absorption in plasmas: Theory and experiment in spherical geometry
    ,D. N. Walker, R. F. Fernsler, D. D. Blackwell, W. E. Amatucci, and S. J. Messer, Phys.
    Plasmas 13, 032108 (2006).
    [21] Modeling and simulation of the plasma absorption probe ,M. Lapke, T. Mussenbrock, R. P.
    Brinkmann, C. Scharwitz, M. Böke, and J. Winter, Appl. Phys. Lett. 90, 121502 (2007).
    [22] Simulation of resistive microwave resonator probe for high-pressure plasma diagnostics ,J.
    Xu, K. Nakamura, Q. Zhang, and H. Sugai, Plasma Sources Sci. Technol. 18 045009, (2009).
    [23] Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film
    and sheath ,J. Xu, J. Shi, J. Zhang, Q. Zhang, K. Nakamura, and H. Sugai, Chinese Phys. B
    19 075206, (2010).
    [24] Experimental and Simulational Studies on the Theoretical Model of the Plasma Absorption
    Probe ,B. Li, H. Li, Z. Chen, J. Xie G. Feng, and W. Liu, Plasma Sci. Technol. 12, 513 (2010).
    [25] Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive
    Plasmas ,I. Linag, K. Nakamura, and H. Sugai, Appl. Phys. Express 4, 066101 (2011)
    [26] Active plasma resonance spectroscopy: a functional analytic description ,M. Lapke, J. Ober-
    15
    rath, T. Mussenbrock und R. P. Brinkmann, Plasma Scources Sci. Technol. 22, 025005 (2013).
    [27] Active plasma resonance spectroscopy: eigenfunction solutions in spherical geometry ,J. Oberrath and R. P. Brinkmann, Plasma Sources Sci. Technol. 23, 065025 (2014)
    [28] The Multipole Resonance Probe: Progression and Evaluation of a Process Compatible Plasma
    Sensor ,C. Schulz and I. Rolfes, IEEE Sensors Journal 14 Issue: 10,Sensors Applications
    Symposium (SAS), IEEE (2014)
    [29] M. Friedrichs and J. Oberrath,"The planar multipole resonance probe: a functional analytic
    approach," EPJ Techn Instrum, vol. 5, Aug. 2018.
    [30] M. Friedrichs, D. Pohle, I. Rolfes and J. Oberrath, "Planar Multipole Resonance Probe:
    Comparison of Full-wave Electromagnetic Simulation and Electrostatic Approximation," 2019
    Kleinheubach Conference, 2019, pp. 1-3.
    [31] C.Wang, M. Friedrichs, J.Oberrath and R.P. Brinkmann 2021 Plasma Sources Sci. Technol.
    30 105011
    [32] The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor,
    C. Schulz, T. Styrnoll, P. Awakowicz and I. Rolfes, IEEE Transactions on Instrumentation
    and Measurement 64, 14981187 (2015)
    [33] Flat cutoff probe for real-time electron density measurement in industrial plasma processing,
    H J Yeom et al 2020 Plasma Sources Sci. Technol. 29 035016

    Presenters

    • Peng Liang

      South Westphalia University of Applied Science Soest

    Authors

    • Michael Friedrichs

      South Westphalia University of Applied Science Soest

    • Peng Liang

      South Westphalia University of Applied Science Soest

    • Chun Jie Wang

      Ruhr-University of Bochum

    • Ralf Peter Brinkmann

      Ruhr-University of Bochum, Institute of Theoretical Electrical Engineering, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany

    • Jens Oberrath

      South Westphalia University of Applied Science

    View abstract →

  • The performance of the pulse bias hairpin resonator probe for negative ion diagnostic

    ORAL

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    Publication: [1] Sirse, N., Karkari, S.K. and Turner, M.M., 2015. Probing negative ion density and temperature using a resonance hairpin probe. Plasma Sources Science and Technology, 24(2), p.022001.
    [2] Singh, P. and Karkari, S.K., 2022. Equilibrium properties of inhomogeneous partially-magnetized plasma containing negative ions. Journal of Physics D: Applied Physics, 55(23), p.235201.

    Presenters

    • Pawandeep Singh

      Institute for Plasma Research

    Authors

    • Pawandeep Singh

      Institute for Plasma Research

    • Swati Swati

      Institute for Plasma Research

    • Jay K Joshi

      Albot Technologies Pvt. Ltd, Pune, Maharashtra 411044, India

    • Nageswara R Epuru

      Institute for Plasma Research

    • Yashshri Patil

      Institute for Plasma Research

    • Shantanu Karkari

      Institute for Plasma Research

    View abstract →

  • Power law parametrization of the ion collecting area for a planar Langmuir probe diagnostic

    ORAL · Invited

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    Publication: Y. Lim et al, Plasma Sources Sci. Technol. 31 (2022) 024001, "Benchmark experiments of the power law parametrization of the effective ion collecting area of a planar Langmuir probe in low temperature plasmas"

    Presenters

    • Yegeon Lim

      KAIST

    Authors

    • Yegeon Lim

      KAIST

    • Gregory Severn

      University of San Diego

    • Chi-Shung Yip

      Chinese Academy of Sciences

    • Young-chul Ghim

      KAIST, Department of Nuclear and Quantum Engineering, KAIST, Daejeon, 34141, S. Korea

    View abstract →

  • Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias

    ORAL

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    Presenters

    • Makoto Sekine

      Nagoya University, Nagoya Univ

    Authors

    • Makoto Sekine

      Nagoya University, Nagoya Univ

    • Bibhuti B Sahu

      Department of Energy Science and Engineering, IIT Delhi

    • Shogo Hattori

      Nagoya University

    • Takayoshi Tsutsumi

      Nagoya University, Nagoya Univ

    • Nikolay Britun

      Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.

    • Kenji Ishikawa

      Nagoya Univ, Nagoya University, Nagoya University, Japan

    • Hirohiko Tanaka

      Nagoya University

    • Taku Gohira

      Tokyo Electron Miyagi

    • Noriyasu Ohno

      Nagoya University, Hiroshima University

    • Masaru Hori

      Nagoya Univ

    View abstract →