Diagnostics III

FOCUS · DF1 · ID: 1530243

Presentations

  • Development of a flat-cutoff sensor for non-invasive plasma density measurement in plasma processing

    ORAL

    –

    Publication: [1] H. J. Yeom, J. H. Kim, D. H. Choi, E. S. Choi, M. Y. Yoon, D. J. Seong, Shin Jae You, and Hyo-Chang Lee, Flat cutoff probe for real-time electron density measurement in industrial plasma processing, Plasma Sources Sci. Technol. 29 (2020) 035016 (13pp)
    [2] Hyo-Chang Lee, Jung Hyung Kim, Daejin Seong, Hee Jung Yeom, PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, Korea Patent. 10-2020-0095022 , PCT Patent. PCT/KR2019/004500, US Patent. 17050373, China Patent. 201980028803.9, EU Patent. 19912976.8, Japan Patent. 52002369478
    [3] Hyo-Chang Lee, Jung Hyung Kim, Hee Jung Yeom, Device for measuring plasma ion density and Apparatus for
    plasma diagnostics using the same, Korea Patent. 1020210022899, US Patent. 17222937, China Patent. 2021110374496.9, EU Patent. 2021167098, Japan Patent. 7113110

    Presenters

    • HeeJung Yeom

      Korea Research Institute of Standards and Science

    Authors

    • HeeJung Yeom

      Korea Research Institute of Standards and Science

    • Min Young Yoon

      Korea Research Institute of Standards and science

    • Eun-Seok Choe

      Korea Research Institute of Standards and Science

    • Dae Jin Seong

      Korea Research Institute of Standards and Science

    • Gwang-Seok Choi

      Korea Research Institute of Standards and Science

    • Shin Jae You

      Chungnam Natl Univ, Department of Physics, Chungnam National University

    • Jung Hyung Kim

      Korea Research Institute of Standards and Science

    • Hyo-Chang Lee

      Korea Aerospace University

    View abstract →