Magnetrons and Multipactors

INVITED · HT1 · ID: 1531182

Presentations

  • Design of rotational RF magnetron sputtering plasma and its characteristics for target utilization saving resources

    ORAL · Invited

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    Publication: 1. Y.Ohtsu, K. Yasuda and J. Schulze, "Temporal evolution of the ion flux to the target in rotational RF multi-magnetron plasma", J. Vac. Sci. Technol. A, 40, 5, 053006(9pp)
    2. K. Yasuda, Y.Ohtsu and J.Schulze, "Development of a cruciform radio-frequency closed magnetron sputtering source including four sectorial magnetron sputtering discharges for uniform target utilization", Vacuum 202(2022)111184(7pp)
    3. Md. A. Hossain, Md. A. M. Patwary, Md. M. Rahman and Y. Ohtsu, "Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source", AIP Advances, 12, (2022), 015224-1-9
    4. Y. Ohtsu, R. Tanaka and T. Nakashima, "Development of rotational maze-shaped RF magnetron plasma for successful target utilization and the thin film preparation", Jpn.J。Appl. Phys., Special Issue: Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, 60, SA(2021), SAAB01-1-7
    5. Y. Ohtsu, T. Nakashima, R. Tanaka and J. Schulze," Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization", Vacuum, 181,(2020) 109593-1-10

    Presenters

    • Yasunori Otsu

      Saga University, Japan

    Authors

    • Yasunori Otsu

      Saga University, Japan

    • Md. Amzad Hossain

      Jashore University of Science and Technology

    • Julian Schulze

      Bochum University, Ruhr University Bochum, Germany, Ruhr-University Bochum

    View abstract →

  • A study of magnetic field effect in low pressure capacitively coupled plasmas

    ORAL · Invited

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    Presenters

    • Sathya S Ganta

      Applied Materials, Inc., Applied Materials Inc, Applied Materials

    Authors

    • Sathya S Ganta

      Applied Materials, Inc., Applied Materials Inc, Applied Materials

    • Kallol Bera

      Applied Materials, Inc., Applied Materials

    • Shahid Rauf

      Applied Materials, Inc., Applied Materials

    • Igor D Kaganovich

      Princeton Plasma Physics Laboratory

    • Alexander V Khrabrov

      Princeton Plasma Physics Laboratory

    • Andrew Tasman T Powis

      Princeton Plasma Physics Laboratory

    • Dmytro Sydorenko

      University of Alberta, University of Alberta, Edmonton, Alberta T6G 2E1, Canada

    • Liang Xu

      Soochow University, China

    View abstract →