Plasma Diagnostics V

FOCUS · DR5 · ID: 2481722





Presentations

  • Measurements of plasma parameters in a semiconductor processing reactor

    ORAL · Invited

    Presenters

    • Andrei Khomenko

      Applied Materials

    Authors

    • Andrei Khomenko

      Applied Materials

    • Santosh Kondeti

      Princeton Plasma Physics Laboratory

    • Leonid Dorf

      Applied Materials

    • Yevgeny Raitses

      Princeton Plasma Physics Laboratory, Princeton Plasma Physics Laboratory (PPPL)

    • Evgeny Kamenetskiy

      Applied Materials

    • Viacheslav Plotnikov

      Applied Materials

    View abstract →

  • Experimental study of intermediate-Pressure RF-CCP in Ar-O<sub>2</sub> mixtures

    ORAL

    Publication: [1] M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 1st ed. (Wiley, 2005).
    [2] J.-P. Booth, O. Guaitella, S. Zhang, D. Lopaev, S. Zyryanov, T. Rakhimova, D. Voloshin, A. Chuka-lovsky, A. Volynets, and Y. Mankelevich, Plasma Sources Sci. Technol. 32, 095016 (2023).

    Presenters

    • Shu Zhang

      Lpp, Ecole Polytechnique

    Authors

    • Shu Zhang

      Lpp, Ecole Polytechnique

    • Garrett Curley

      LPP-CNRS, Ecole Polytechnque, Palaiseau, France

    • Jean-Paul Booth

      LPP-CNRS, The French National Centre for Scientific Research (CNRS)

    View abstract →

  • Spectroscopy of rubidium Rydberg states in inert buffer gases

    ORAL

    Publication: Phys. Rev. Applied 21, 064004

    Presenters

    • Bineet K Dash

      University of Michigan, Ann Arbor

    Authors

    • Bineet K Dash

      University of Michigan, Ann Arbor

    • Eric G Paradis

      Eastern Michigan Univ

    • Nithiwadee Thaicharoen

      Chiang Mai Univ

    • Alisher Duspayev

      University of Michigan

    • Georg A Raithel

      University of Michigan

    View abstract →

  • A two-color heterodyne interferometer for high-speed measurement of electron density in partially ionized gases and plasma

    ORAL

    Presenters

    • Rishav Choudhary

      University of Michigan - Ann Arbor

    Authors

    • Rishav Choudhary

      University of Michigan - Ann Arbor

    • Bilal Hassan

      University of Michigan, University of Michigan - Ann Arbor

    • Kaeshav Chandrasekar

      University of Michigan - Ann Arbor

    • Tyler Linfesty

      University of Michigan, University of Michigan - Ann Arbor

    • Christopher M Limbach

      University of Michigan

    • Yue Wu

      Metro Lasers Inc.

    • Jacob George

      Metro Lasers Inc.

    View abstract →