Plasma Diagnostics V
FOCUS · DR5 · ID: 2481722
Presentations
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Measurements of plasma parameters in a semiconductor processing reactor
ORAL · Invited
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Presenters
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Andrei Khomenko
Applied Materials
Authors
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Andrei Khomenko
Applied Materials
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Santosh Kondeti
Princeton Plasma Physics Laboratory
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Leonid Dorf
Applied Materials
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Yevgeny Raitses
Princeton Plasma Physics Laboratory, Princeton Plasma Physics Laboratory (PPPL)
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Evgeny Kamenetskiy
Applied Materials
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Viacheslav Plotnikov
Applied Materials
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Experimental study of intermediate-Pressure RF-CCP in Ar-O<sub>2</sub> mixtures
ORAL
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Publication: [1] M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 1st ed. (Wiley, 2005).
[2] J.-P. Booth, O. Guaitella, S. Zhang, D. Lopaev, S. Zyryanov, T. Rakhimova, D. Voloshin, A. Chuka-lovsky, A. Volynets, and Y. Mankelevich, Plasma Sources Sci. Technol. 32, 095016 (2023).Presenters
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Shu Zhang
Lpp, Ecole Polytechnique
Authors
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Shu Zhang
Lpp, Ecole Polytechnique
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Garrett Curley
LPP-CNRS, Ecole Polytechnque, Palaiseau, France
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Jean-Paul Booth
LPP-CNRS, The French National Centre for Scientific Research (CNRS)
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Quantitative measurements of atomic oxygen using hybrid fs/ps CARS
ORAL
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Presenters
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Timothy Chen
Applied Materials, Inc.
Authors
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Timothy Chen
Applied Materials, Inc.
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Christopher J Kliewer
Sandia National Lab, Livermore, CA, Sandia National Laboratories
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Spectroscopy of rubidium Rydberg states in inert buffer gases
ORAL
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Publication: Phys. Rev. Applied 21, 064004
Presenters
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Bineet K Dash
University of Michigan, Ann Arbor
Authors
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Bineet K Dash
University of Michigan, Ann Arbor
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Eric G Paradis
Eastern Michigan Univ
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Nithiwadee Thaicharoen
Chiang Mai Univ
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Alisher Duspayev
University of Michigan
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Georg A Raithel
University of Michigan
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A two-color heterodyne interferometer for high-speed measurement of electron density in partially ionized gases and plasma
ORAL
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Presenters
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Rishav Choudhary
University of Michigan - Ann Arbor
Authors
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Rishav Choudhary
University of Michigan - Ann Arbor
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Bilal Hassan
University of Michigan, University of Michigan - Ann Arbor
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Kaeshav Chandrasekar
University of Michigan - Ann Arbor
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Tyler Linfesty
University of Michigan, University of Michigan - Ann Arbor
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Christopher M Limbach
University of Michigan
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Yue Wu
Metro Lasers Inc.
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Jacob George
Metro Lasers Inc.
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