Workshop II: Data-driven Plasma Science
INVITED · EM2 · ID: 2507708
Presentations
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Physics-informed neural networks for calculation and measurement of fundamental data on electron transport in plasmas
ORAL · Invited
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Presenters
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Satoru Kawaguchi
Muroran Institute of Technology
Authors
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Satoru Kawaguchi
Muroran Institute of Technology
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Kazuhiro Takahashi
Muroran Institute of Technology
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Kohki Satoh
Muroran Institute of Technology
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Data-Enabled Control of Low-Temperature Plasma Interactions with Complex Interfaces
ORAL · Invited
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Presenters
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Ali Mesbah
University of California, Berkeley
Authors
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Ali Mesbah
University of California, Berkeley
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Coffee Break
COFFEE_KLATCH
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Neural Network Model of Radio-Frequency Plasmas
ORAL · Invited
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Presenters
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Kallol Bera
Applied Materials, Applied Materials, Inc.
Authors
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Kallol Bera
Applied Materials, Applied Materials, Inc.
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Abhishek Verma
Applied Materials
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Sathya Swaroop Ganta
Applied Materials Inc
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Shahid Rauf
Applied Materials, Applied Materials, Inc.
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Human-Machine Collaboration in Semiconductor Process Development
ORAL · Invited
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Publication: Kanarik, et al. Nature 616, 707–711 (2023)
Presenters
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Richard Alan Gottscho
Lam Research
Authors
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Richard Alan Gottscho
Lam Research
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Keren Kanarik
Lam Research
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Wojciech T Osowiecki
Lam Research
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Yu Lu
Lam Research
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Dipongkar Talukder
Lam Research
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Niklas Roschewsky
Lam Research
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Sae Na Park
Lam Research
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Matt Kamon
Lam Research
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David Michael Fried
Lam Research
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Lunch
COFFEE_KLATCH
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Recent developments in the provision of atomic and molecular data for plasma modelling
ORAL · Invited
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Presenters
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Jonathan Tennyson
University College London
Authors
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Jonathan Tennyson
University College London
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Gregory Armstrong
Quantemol Ltd
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Kateryna Lemishko
Quantemol Ltd
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Anna Nelson
Quantemol Ltd
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Sebastian Mohr
Quantemol Ltd
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Physics-informed low-temperature plasma simulation: frameworks and applications
ORAL · Invited
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Publication: [1] L. Zhong, Q. Gu and B. Wu, Computer Physics Communications 257, 107496 (2020).
[2] L. Zhong, B. Wu and Y. Wang, Physics of Fluids 34 (8), 087116 (2022).
[3] L. Zhong, B. Wu and Y. Wang, Journal of Physics D: Applied Physics 56 (7), 074006 (2023).
[4] Y. Wang and L. Zhong, Journal of Computational Physics 496, 112603 (2024).Presenters
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Linlin Zhong
Southeast University
Authors
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Linlin Zhong
Southeast University
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Data-driven plasma science-based plasma etching process design in OLED and Semiconductor mass productions referring to PI-VM
ORAL · Invited
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Publication: [1] S. Park, J.Seong, G.-H. Kim et al., J. Kor. Phys. Soc., 80 (2022) 8.
[2] S. Park, J.Seong, Y.Park, Y.Noh, H.Lee, N.Bae, K.-B.Roh, R.Seo, B.Song, and G.-H.Kim, Plasma.Phys.Cont.Fusion. 66 (2024) 2.
Presenters
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Seolhye Park
Samsung Display Co.,Ltd.
Authors
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Seolhye Park
Samsung Display Co.,Ltd.
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Jaegu Seong
Samsung Display Co.,Ltd.
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Yoona Park
Samsung Display Co.,Ltd.
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Haneul Lee
Seoul National University
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Namjae Bae
Seoul National University
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Gon-Ho Kim
Seoul National University
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Plasma process optimization using machine learning
ORAL · Invited
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Publication: Tsuyoshi Moriya, Yusuke Suzuki, Hitoshi Yonemichi and Hironori Moki, J. Phys. D: Appl. Phys. 56 (2023) 354002
Presenters
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Tsuyoshi Moriya
Tokyo Electron Technology Solutions Ltd.
Authors
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Tsuyoshi Moriya
Tokyo Electron Technology Solutions Ltd.
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Coffee Break
COFFEE_KLATCH
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Demonstrating Data-Driven Capabilities for use in Plasma Physics
ORAL · Invited
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Presenters
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Christine Greve
AFRL
Authors
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Christine Greve
AFRL
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A Study for Solving the Boltzmann Equation with Variable E/N using Physics-informed Neural Networks
ORAL · Invited
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Publication: [1] Kawaguchi S, Takahashi K, Ohkama K, and Satoh K 2020 Plasma Sources Sci. Technol. 29 025021
[2] Kawaguchi S and Murakami T 2022 Jpn. J. Appl. Phys. 61 086002
[3] Kawaguchi S, Takahashi K, Satoh K, and Itoh H 2016 Jpn. J. Appl. Phys. 55 07LD03
[4] Kawaguchi S, Takahashi K, and Satoh K 2021 Plasma Sources Sci. Technol. 30 035010Presenters
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Kim Jinseok
Tokyo Electron Technology Solutions Limited
Authors
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Kim Jinseok
Tokyo Electron Technology Solutions Limited
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Kazuki Denpoh
Tokyo Electron Technology Solutions Limited
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Satoru Kawaguchi
Muroran Institute of Technology
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Kohki Satoh
Muroran Institute of Technology
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Masaaki Matsukuma
Tokyo Electron Technology Solutions Limited
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An Introduction to Version 3 of the LXCat Plasma Input Data Platform
ORAL · Invited
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Presenters
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Jan Van Dijk
Eindhoven University of Technology
Authors
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Jan Van Dijk
Eindhoven University of Technology
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Daan J Boer
Eindhoven University of Technology
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Open Discussion
COFFEE_KLATCH
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