Plasma Etching I
FOCUS · ET2 · ID: 2480671
Presentations
-
Physical and chemical effects in low temperature etching of memory devices
ORAL · Invited
–
Presenters
-
Thorsten Lill
Lam Research
Authors
-
Thorsten Lill
Lam Research
-
Youn-Jin Oh
Lam Research
-
Mark Wilcoxson
Lam Research
-
Harmeet Singh
Lam Research, Lam Research Corporation
-
-
Digital Twins for Plasma-Surface Interactions in Atomic Layer Etching
ORAL
–
Presenters
-
David Barry Graves
Chemical & Biological Engineering Princeton University, Princeton University
Authors
-
David Barry Graves
Chemical & Biological Engineering Princeton University, Princeton University
-
Joseph R Vella
TEL Technology Center, America
-
-
Effect of Secondary Electron Emission on Surface Charging during Plasma Etching for Microelectronics Fabrication
ORAL
–
Presenters
-
Chenyao Huang
University of Michigan
Authors
-
Chenyao Huang
University of Michigan
-
Steven C Shannon
North Carolina State University
-
Mark Jay Kushner
University of Michigan
-
-
Process Control of Plasma Etching of SiN, SiO<sub>2</sub> and poly-Si films via Enhanced Fragmentation of CHF<sub>2</sub>CF<sub>3</sub> and CF<sub>3</sub>CH<sub>3</sub>, CHF<sub>2</sub>CH<sub>3</sub>
ORAL
–
Presenters
-
Trung Nguyen Tran
Nagoya University
Authors
-
Trung Nguyen Tran
Nagoya University
-
Toshio Hayashi
Nagoya University
-
Hiroshi Iwayama
UVSOR Sychrotron Facility
-
Shih-Nan Hsiao
Nagoya university
-
Makoto Sekine
Nagoya University
-
Masaru Hori
Center for Low-temperature Plasma Sciences, Nagoya University, Japan, Nagoya University
-
Kenji Ishikawa
Center for Low-temperature Plasma Sciences, Nagoya University, Japan, Nagoya University, Japan
-
-
Characterization and Effects of Fluorine-Containing Ionic Liquid Ion Beams on Metal-Coated Substrates
ORAL
–
Presenters
-
Nazli Turan
University of Southampton
Authors
-
Nazli Turan
University of Southampton
-
Charlie Ryan
University of Southampton
-
-
Extraction and Transport of Positive and Negative Ions in Plasma Etch Applications
ORAL
–
Presenters
-
Sergey Voronin
TEL Technology Center, TEL TECHNOLOGY CENTER, AMERICA, LLC
Authors
-
Sergey Voronin
TEL Technology Center, TEL TECHNOLOGY CENTER, AMERICA, LLC
-
Nicholas Smieszek
TEL TECHNOLOGY CENTER, AMERICA, LLC
-
Carl Lynwood Smith
TEL TECHNOLOGY CENTER, AMERICA, LLC
-
Qi Wang
TEL TECHNOLOGY CENTER, AMERICA, LLC
-
Akiteru Ko
TEL TECHNOLOGY CENTER, AMERICA, LLC
-