Developing an experimental database that can be used for validation of Particle-in-cell Simulations

Recently, semiconductor and display plasma processes are facing limitations due to narrowing of device line widths and high aspect ratios, and to solve this, process control based on understanding plasma properties is essential. Accordingly, it is necessary to understand plasma physics phenomena through particle-in-cell simulations. In this presentation, experimental database for validation of particle-in-cell simulations will be presented. It contains the plasma measurement results in rare gases [Applied Physics Reviews 5, 011108 (2018), Plasma Sources Sci. Technol. 29 035016 (2020), etc] and process molecular gases [Phys. Plasmas 28, 063504 (2021), Appl. Surf. Sci. 636 157814 (2023), etc] discharges with wafer processing results.