Cavity ring-down spectroscopy of the spatial density distributions of H2O2 in the effluent of the COST-Jet and the kINPen-sci.
ORAL
Abstract
Cold atmospheric plasma jets (CAPJ) operated with a helium feed gas containing small admixtures of water vapour are excellent sources of H2O2 for localized treatment of heat-sensitive surfaces and biological tissue. A detailed understanding of the complex plasma chemistry inside the plasma as well as in the effluent is required to be able to tailor the composition of reactive species, in particular reactive oxygen and nitrogen species (RONS), to specific applications. Direct, sensitive and selective measurements of key RONS are important for this but remain challenging. This study uses continuous-wave cavity ring-down spectroscopy to determine the spatial distribution of the H2O2 molecules in the effluent of two widely used CAPJs: kINPen-sci and COST-Jet. The measured H2O2 density close to the jet nozzle was found to be 2.3×1014 cm−3 for the kINPen-sci and 1.4×1014 cm−3 for the COST-Jet. In the effluent, up to 35 mm from the nozzle, the density in the kINPen-sci is roughly a factor two higher than in the COST-Jet. For the COST-jet, the distribution of H2O2 in the effluent up to 15 mm is initially highly uniform, suggesting negligible mixing of the plasma with ambient air. At greater distances, there is strong mixing and the H2O2 density is rapidly diluted. For the kINPen-sci jet, there is a more pronounced radial profile close to the nozzle, but a more gradual mixing of ambient air with distance. This work highlights the differences between the spatial distribution of H2O2 in the effluent of both types of plasma jet as a result of the source design and ambient mixing. For applications this means that a detailed understanding of the H2O2 production in the plasma source, as well as of the transport of H2O2 to the substrate through the effluent, is required to optimise the intended effects in a treatment.
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Publication:B. Harris, L. Kro s, A.S.C. Nave, E. Wagenaars, and J.H. van Helden, 2023 Plasma Sources Sci. Technol. 32 115010, https://iopscience.iop.org/article/10.1088/1361-6595/ad0742
Presenters
Erik Wagenaars
York Plasma Institute, University of York, UK, York Plasma Institute, University of York, University of York
Authors
Ben Harris
York Plasma Institute, University of York, UK
Levin Krös
Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany
Andy Nave
Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany
Erik Wagenaars
York Plasma Institute, University of York, UK, York Plasma Institute, University of York, University of York
Jean-Pierre van Helden
Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany