A pH and conductivity-based method for fast and accurate NOx- estimate in plasma-treated water
ORAL
Abstract
The number of plasma applications have had growth in recent years, making them an increasingly valuable and relevant technology in various fields. Plasma is applied directly or to different mediums that can later be used for different applications.
During water treatment, reactive oxygen and nitrogen species (RONS) are created and dissolved in water, resulting in a conductive solution. Their interaction mechanisms make PTW a chemically active solution for different treatments. Accurately estimating the species created during plasma treatment is critical for tailoring the treated water to different applications.
Following these species can be done in many ways, including strips, colorimetry, luminescence, absorption spectroscopy, and others. While some methods offer fast estimate of RONS, they often lack accuracy and more complex methods require expensive equipment and more time. This is why new accurate methods to follow the species are of high importance.
Conductivity and pH are parameters often followed in PTW research. The new proposed method utilizes pH and conductivity measurements by using Kohlrausch’s law of independent ion migration with the assumption that the main charged species in the water are H+ and NOx-. By using these specific PTW parameters, we can accurately and rapidly determine the concentrations of NOx- species up to 1mM. The new method shows consistent results with those achieved using UV absorption spectroscopy, proving the method both fast and accurate.
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Publication: Petković, J., et al. (2024). Assessment of reactive species concentrations in plasma-treated water: a pH and conductivity-based method validated by absorption spectroscopy.
Journal of Physics D: Applied Physics,57(23), Article 235202 . https://doi.org/10.1088/1361-6463/ad31e1
Presenters
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Jovana Petkovic
Eindhoven University of Technology
Authors
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Jovana Petkovic
Eindhoven University of Technology
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Robin van de Wege
Eindhoven University of Technology
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Jente Wubs
Leibniz Institute for Plasma Science and Technology (INP)
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Olivier Van Rooij
Eindhoven University of Technology
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Jeroen van Oorschot
Eindhoven University of Technology
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Tom Huiskamp
Eindhoven University of Technology
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Ana Sobota
Eindhoven University of Technology