Organic Micropollutant Wastewater Treatment using a DBD Plasma and Flat 222 nm Far UV-C Excilamp

ORAL

Abstract

Conventional low-pressure UV (LP-UV) lamps emit light with a wavelength of 254 nm, which is efficient in deactivation of microorganisms but can also be harmful to the skin and eyes upon exposure. In contrast, KrCl* excimer lamps emit ultraviolet (UV) light in the far-UVC range, specifically between 200 and 222 nanometers (nm). These lamps have been demonstrated to successfully eliminate harmful microorganisms without posing a risk of harming human cells. Several studies have been published that provide evidence that far-UVC is a safer option for human exposure and more efficient in terms of disinfection than LP-UV [1] [2]. Nevertheless, few studies have examined the utilization of KrCl* excimer lamps for UV/advanced oxidation processes (AOPs) [3].

In this study, two organic micropollutants have been degraded by means of an environmentally friendly mercury-free far UV-C excimer light source along with an advanced oxidation process (AOP) using H2O2. For this purpose, a dielectric barrier discharge (DBD) plasma-based 222 nm wavelength excilamp has been designed and developed. The production of OH radicals in three different Advanced Oxidation Process (AOP) systems—LP-UV/H2O2, KrCl*/H2O2, and KrCl*/nitrate—was then compared. The results indicate that the UV/nitrate combination exhibited the highest level of steady-state OH concentration, followed by KrCl*/H2O2, and then LP-UV/H2O2. Additionally, we examined the differences in contaminant degradation for carbamazepine and sulfamethoxazole between KrCl* excimer lamps and low-pressure ultraviolet (LPUV) lamps. The findings show that, in comparison to LP-UV treatment, direct photolysis employing KrCl* excimer lamps significantly improves the degradation rate constants of carbamazepine and sulfamethoxazole. This improvement is likely due to a molar absorption coefficient that is more prominent at 222 nm rather than 254 nm. Compared to KrCl* excimer direct photolysis, KrCl*/AOP demonstrated improved degradation of carbamazepine; however, it did not increase the degradation of sulfamethoxazole. The analysis of this study will be presented.

Publication: [1] K. Ahlawat, R. Jangra, A. Ish, N. Jain, and R. Prakash, A Dielectric Barrier Discharge Based Low Pressure Narrow Band Far UV-C 222 Nm Excimer Lamp and Its Efficiency Analysis, Phys. Scr. 99, 025018 (2024).
[2] K. Ahlawat, R. Jangra, and R. Prakash, Environmentally Friendly UV ‑ C Excimer Light Source with Advanced Oxidation Process for Rapid Mineralization of Azo Dye in Wastewater, ACS Omega 9, 15615 (2024).
[3] K. Ahlawat, R. Jangra, and R. Prakash, Accelerated Mineralization of Textile Wastewater under 222 Nm Irradiation from Kr/Cl2 Excilamp : An Environmentally Friendly and Energy Efficient Approach, Sci. Rep. 1 (2024).

Presenters

  • Kiran Ahlawat

    Indian Institute of Technology, Jodhpur

Authors

  • Kiran Ahlawat

    Indian Institute of Technology, Jodhpur

  • Ramavtar Jangra

    Indian Institute of Technology Jodhpur

  • Ram Prakash

    Indian Institute of Technology, Jodhpur, Indian Institute of Technology Jodhpur