Discharge Plasma IV

FOCUS · GR5 · ID: 2480991

Presentations

  • Ion Energy Control by Voltage Waveform Tailoring in ICPs with Substrate Bias for Plasma Etching

    ORAL

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    Presenters

    • Jonas Giesekus

      Ruhr-Universität Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    Authors

    • Jonas Giesekus

      Ruhr-Universität Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Florian Beckfeld

      Ruhr-University Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Katharina Noesges

      Ruhr University Bochum, 44780 Bochum, Germany, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Claudia Bock

      Ruhr-University Bochum

    • Julian Schulze

      Ruhr University Bochum, Germany, Ruhr University Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    View abstract →

  • Electron-Beam Generated Plasmas: Modeling and Comparison to Experiments

    ORAL

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    Presenters

    • Mackenzie E Meyer

      National Research Council Postdoctoral Research Associate, Plasma Physics Division, US Naval Research Laboratory, US Naval Research Laboratory

    Authors

    • Mackenzie E Meyer

      National Research Council Postdoctoral Research Associate, Plasma Physics Division, US Naval Research Laboratory, US Naval Research Laboratory

    • David R Boris

      Plasma Physics Division, US Naval Research Laboratory

    • Michael J Johnson

      Plasma Physics Division, US Naval Research Laboratory, U.S. Naval Research Laboratory

    • Tzvetelina B Petrova

      Plasma Physics Division, US Naval Research Laboratory

    • Mark Jay Kushner

      University of Michigan

    • Scott G Walton

      Plasma Physics Division, US Naval Research Laboratory

    View abstract →

  • The interaction of atmospheric pressure plasmas with targets

    ORAL · Invited

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    Publication: 1. Plasma Sources Sci. Technol. 31 (2022) 053001, https://doi.org/10.1088/1361-6595/ac61a9
    2. Scientific Reports (2022) 12:1157, https://doi.org/10.1038/s41598-022-05075-4
    3. Scientific Reports (2022) 12:1181, https://doi.org/10.1038/s41598-022-04914-8
    4. Plasma Sources Sci. Technol. 29 (2020) 095011, https://doi.org/10.1088/1361-6595/aba7ec
    5. Scientific Reports (2020) 10:2712, https://doi.org/10.1038/s41598-020-59345-0
    6. Scientific Reports (2020) 10:13580, https://doi.org/10.1038/s41598-020-70452-w
    7. Plasma Sources Sci. Technol. 28 (2019) 095016, https://doi.org/10.1088/1361-6595/ab3c27
    8. Plasma Sources Sci. Technol. 27 (2018) 094002, https://doi.org/10.1088/1361-6595/aadcc0
    9. Plasma Sources Sci. Technol. 27 (2018) 085004, https://doi.org/10.1088/1361-6595/aad4d7
    10. J. Phys. D: Appl. Phys. 51 (2018) 115203, https://doi.org/10.1088/1361-6463/aaad99

    Presenters

    • Ana Sobota

      Eindhoven University of Technology

    Authors

    • Ana Sobota

      Eindhoven University of Technology

    • Olivier Van Rooij

      Eindhoven University of Technology

    • Marlous Hofmans

      Eindhoven University of Technology

    • Elmar Slikboer

      Ecole Polytechnique

    • Pedro Viegas

      Instituto Superior Técnico - Universidade de Lisboa

    • Enrique Garcia-Caurel

      Ecole Polytechnique

    • Olivier Guaitella

      LPP, CNRS, École Polytechnique, Sorbonne Université, Université Paris-Saclay, IP-Paris, Palaiseau, France, LPP, Ecole Polytechnique, CNRS

    • Anne Bourdon

      Ecole Polytechnique

    View abstract →