Advancement in the probe diagnostics for characterization of a Capacitively Coupled RF Discharge

POSTER

Abstract

Capacitively coupled Radio Frequency (CCRF) discharges find diverse applications, spanning from plasma processing of semiconductors to ion thrusters crucial for satellite positioning and generating energetic charged particle beams from plasma sources in space. There are two essential parameters for the plasma processing techniques: the ion density and its energy accelerated by the sheath. Therefore, it is crucial to determine the plasma density and the electron temperature, as the ionization rate is directly proportional to the electron temperature (Te), and the sheath potential is also coupled to Te. For this purpose, multiple diagnostics techniques have been developed, such as the RF-compensated Langmuir probe, EEDF measurements using the 2nd harmonic detection method, and RF-compensated biased Hairpin Resonator Probe. The probe theories have been revisited and implemented according to the discharge conditions. This study explores the application of these probe diagnostics for the characterisation of a low-pressure geometrically asymmetric 13.56 MHz driven capacitively coupled plasma (CCP) cylindrical device.

Publication: [1] S. Dahiya, et al, "Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field," Phys. Plasmas, vol. 30, no. 9, Sep. 2023, doi: 10.1063/5.0160506.
[2] S. Dahiya, et al, "Magnetic field induced electron temperature inhomogeneity effects on discharge properties in cylindrical capacitively coupled plasmas," Phys. Lett. A, vol. 468, p. 128745, Apr. 2023, doi: 10.1016/j.physleta.2023.128745.
[3] Singh, P., Dahiya, S., Pandey, A.K. and Karkari, S., 2023. Hairpin probe assisted saturation current ratio method to determine plasma electronegativity. Plasma Sources Science and Technology 32(4), p.045013
[4] Swati Dahiya, Pawandeep Singh, AK Pandey and Shantanu Karkari RF Compensated Hairpin Resonator Probe for application in Radio Frequency Discharges. (Manuscript to be submitted.)

Presenters

  • Swati Dahiya

    Institute for Plasma Research, HBNI

Authors

  • Swati Dahiya

    Institute for Plasma Research, HBNI

  • Pawandeep Singh

    Institute for Plasma Research

  • Avnish K Pandey

    Department of Applied Science and Humanities, United College of Engineering and Research, Prayagraj—211009, India

  • Sarveshwar Sharma

    Institute for Plasma Research

  • Nishant Sirse

    Institute of Science and Research and Centre for Scientific and Applied Research, IPS Academy, Indore-452012, India

  • Shantanu K Karkari

    Institute for Plasma Research