An Investigation on the Correlation between Langmuir probe, OES, VI probe data measured in N2 and Ar plasma of ICP reactor

Previous studies have analyzed the correlation between the measurement results of various measuring devices and N2 plasma factors and it was confirmed that there is a possibility of speculating plasma factors through VI probe harmonics measurement results. OES data were further analyzed while extending this study to Ar plasma. We used an ICP reactor with an RF power of 13.56 MHz, a power range is up to 1000 watt, 50 watt step and the pressure is between 5 and 50 mTorr, 5 mTorr step. Langmuir probe was used to measure plasma parameters. OES and two VI probes were also measured at the same time. One VI probe was installed on the antenna side and the other on the substrate. The correlation between all data measured in N2 and Ar plasma (plasma density, plasma temperature, floating potential, plasma potential of Langmuir probe, the intensity of each wavelength of the OES, and each harmonics of VI probes) is investigated. And after classifying factors with high correlation, we will discuss whether there is a connection between each data.