Self-assembly of block-copolymers on binary chemical nanopatterns

Thin films of block-copolymers have received great attention as they can self-assemble in ordered periodic structures at the molecular scale [1]. There are different ways by which ordering can be obtain over large areas [2-4]. One such way consists of the local tailoring of the substrate by placing chemical moieties at regularly repeated locations [5]. Here we present another versatile way to control the ordering of block-copolymers over micrometer-scale areas. Fabrication process and examples of chemically nanopatterned substrates will be first shown. The substrates are created by combining the ability of the e-beam lithography to create nanometer-scale regions with self-assembly of alkanethiols. In a second part, the study of self-assembly of symmetric and asymmetric block-copolymers on such nanopatterns will be presented. References [1] F. S. Bates, Science, \textbf{251}, 898 (1991). [2] T. L. Morkved \textit{et al.}, Science \textbf{273}, 931 (1996). [3] M. D. Morariu, N. E. Voicu, E. Schaffer, Z. Lin, T. P. Russell, U. Steiner, Nature Materials \textbf{2}, 48 (2003). [4] C. Park \textit{et al.}, Appl. Phys. Lett. \textbf{79}, 848 (1996). [5] S. O. Kim, H. H. Solak, M.P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey, Nature \textbf{424}, 411 (2003).