Structures and phase transitions in the growth of tetracene on silicon

We report a study on the evolution of the morphology of tetracene thin films during vapor deposition. The film growth has been carried out at room temperature in vacuum on H-passivated silicon substrates. We investigate the surface structures of the films under different growth conditions with an ex-situ atomic force microscopy. The surface structures have been found sensitive to the kinetic parameters such as the coverage and the deposition rate, and in favor of 3D-island formation.