Sub-100 nm interferometric lithography realized with table top extreme ultraviolet lasers

ORAL

Abstract

We demonstrated patterning of arrays of nano-dots with feature sizes below 100 nm by interferometric lithography using a table top extreme ultraviolet 46.9 nm wavelength laser. The interferometric lithography setup was based on a Lloyd's mirror interferometer and multiple exposures. That allowed the patterning of arrays of nano-dots over areas of 500$\times $500 $\mu $m$^{2}$ on commercial photoresists with different motifs. This new technique demonstrates the printing capability of nano-scale patterns with a compact table-top set up at extreme ultraviolet wavelengths.

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Authors

  • Mario Marconi

    Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA, Departament of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA

  • Przemyslaw Wachulak

    Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA, Departament of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA

  • Dineshchandra Patel

    Departament of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA

  • Maria Gabriela Capeluto

    Departamento de Fisica, Facultad de Ciencias Exactas y Naturales, Ciudad Universitaria, Buenos Aires, C1428EHA, Argentina

  • Carmen Menoni

    Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA, Departament of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA

  • Jorge Rocca

    Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA, Departament of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA