CVD grown SWCNTs on Si substrate from DPN patterned catalyst precursor.

ORAL

Abstract

Much interest has been generated around patterning and synthesis of high quality single wall carbon nanotubes (SWCNTs) into desired architectures. Here we report our work, undertaken to elucidate a simple method for delivering catalyst nanoparticles on defined locations on Si substrate via direct writing approach. We applied the Dip Pen Nanolithography (DPN) approach to pattern catalyst nanoparticles in selective locations on the substrate and developed a successful recipe for the subsequent CVD growth to produce high quality SWCNTs into scalable array geometries. Key parameters for successful implementation of this technology into devices or circuit architectures will be discussed. We will present our results on patterning, synthesis and characterization of SWCNTs as-grown on the substrate. Raman spectroscopy analysis, electrical and thermal properties of individual SWCNTs prepared into complex nanodevices will be presented in progress.

Authors

  • Irma Kuljanishvili

    Department of Physics \& Astronomy, Northwestern University

  • Rachel Koltun

    Department of Physics \& Astronomy, Northwestern University

  • Scott Mayle

    Department of Physics \& Astronomy, Northwestern University

  • Venkat Chandrasekhar

    Department of Physics \& Astronomy, Northwestern University

  • Dmitriy Dikin

    Northwestern University, Evanston, IL, Department of Mechanical Engineering, Northwestern University

  • Sergey Rozhok

    NanoInk, Inc.