Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning

ORAL

Abstract

We demonstrate that Polystyrene-\textit{block}-poly(methyl methacrylate) (PS-$b$-PMMA) can self-assemble in a well-aligned, long-range ordered nano-pattern over arbitrarily large areas, commensurate with chemically pre-patterned templates prepared by electron beam (EB) lithography. We also demonstrate that the self-assembly process can interpolate points in between the EB generated pattern, thus multiplying the pattern density. Moreover, we show the results of the investigation about the time-evolution of the self-assembled structure during annealing process.

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Authors

  • Mikihito Takenaka

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Yasuhiko Tada

    • Materials Research Laboratory, Hitachi Ltd.

  • Satoshi Akasaka

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Synsuke Aburaya

    • Kyoto University
    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University

  • Hiroshi Yoshida

    • Materials Research Laboratory, Hitachi Ltd.

  • Hirokazu Hasegawa

    • Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
    • Kyoto University

  • Elizabeth Dobisz

    • San Jose Research Center, Hitachi Global Storage Technologies

  • Dan Kercher

    • San Jose Research Center, Hitachi Global Storage Technologies