Crosslink Density Variations with Process Conditions in Plasma Polymerized Photonic Films

ORAL

Abstract

The structures of plasma polymerized homopolymer octafluorocyclobutane (PP-OFCB) films made under different processing conditions were studied using x-ray reflectivity (XR) and neutron reflectivity (NR). The processing parameters varied were monomer feed location, plasma power, and pressure. Each dry film had a surface layer of thickness $\sim $20{\AA} and a thin layer of $\sim $10{\AA} thickness at the substrate in which the crosslink density was lower than in the bulk polymer film. The region of lower cross-link density at the film-air interface reflects the extent of a reaction zone that moves with the deposition and is responsible for dictating the width of interfaces that are formed when a layer of different precursor is deposited atop the first layer. Results from bilayer films support this view. Such a reaction zone is also seen for benzene and iron-containing plasma polymerized films.

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Authors

  • Somesh Peri

    The University of Akron

  • Mark Foster

    University of Akron, The University of Akron

  • Jesse Enlow

    Wright Patterson Airf Force Base

  • Hao Jiang

    Wright Patterson Airf Force Base

  • Timothy Bunning

    Wright Patterson Airf Force Base

  • Bulent Akgun

    National Institute of Standards and Technology, Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742

  • Sushil Satija

    Center for Neutron Research, National Institutes of Standards and Technology, Gaithersburg, MD 20899, National Institute of Standards and Technology, NIST - Center for Neutron Research, Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

  • Charles F. Majkrzak

    National Institute of Standards and Technology, NIST - Center for Neutron Research