Simulation of Line Edge Roughness in Weakly Segregated and Strongly Segregated Diblock Copolymer Resists

We discuss phase-field simulations of $A$--$B$ interfacial roughness (\textit{i.e.}, ``line edge roughness'') in weakly segregated and strongly segregated $AB$ diblock copolymer resists. Line edge roughness---in particular, long-wavelength line edge roughness---can be especially troublesome for resist scientists because of its ability to disrupt final device function. We examine the relative magnitude \textit{and} spectral character of long-wavelength line edge roughness in weakly segregated and strongly segregated $AB$ diblock copolymer resists using a stochastic version of the Leibler-Ohta-Kawasaki phase-field theory of block copolymer ordering [T. Ohta and K. Kawasaki, \textit{Macromolecules} \textbf{19}, 2621 (1986)].