Neutron Reflectivity Studies of Thin Films of Symmetric Block Copolymer and PS-Modified C$_{60}$

C$_{60}$ has a miscibility limit of approximately 1wt{\%} in polystyrene as indicated by wide angle x-ray scattering and molecular dynamics simulations. In order to use block copolymers as a template for creating ordered arrays of fullerenes, it necessary to increase the concentration of C$_{60}$ while maintaining dispersion. C$_{60}$ grafted with six polystyrene arms (C$_{60}$PS$_{6})$ was shown to be miscible with PS up to 80wt{\%} as C$_{60}$ aggregation was not observed. Because C$_{60}$PS$_{6}$ offers improved miscibility with PS, we have investigated C$_{60}$PS$_{6}$ with a symmetric poly(deuterated styrene-$b$-methyl methacrylate) block copolymer (dPS-PMMA) using neutron reflectivity (NR). NR was used to examine the effects of nanoparticle concentration and size, annealing conditions, and thin film thickness on the location and formation of a C$_{60}$PS$_{6 }$layer and block copolymer phase behavior. Reflectivity results indicate the formation of dPS-PMMA lamellae oriented parallel to the silicon substrate after thermal annealing for films prepared from 4wt{\%} solution at all concentrations of C$_{60}$PS$_{6}$ investigated. Similar results were seen for films prepared at different thicknesses and annealed at constant temperature.