Half integer quantum Hall effect in high mobility single layer epitaxial graphene

ORAL

Abstract

We present results on the quantum Hall effect for single layer epitaxial graphene grown on the C-face of 4H silicon carbide. Hall plateaus at half integer values and vanishing resistivity are observed for high mobility samples ($\mu= 20,000 cm^{2}/V.s$ at 4 K and $15,000 cm^{2}/V.s$ at 300 K) despite contamination and substrate steps. This is comparable to the best exfoliated graphene flakes on SiO2 and an order of magnitude larger than Si-face epitaxial graphene monolayers. Splitting of the n=0 Landau level ($\nu=1$) is observed at high field. These and other properties indicate that C-face epitaxial graphene is an ideal platform for graphene-based electronics.

Authors

  • Claire Berger

    • Georgia Institute of Technology
    • GATECH \& CNRS
  • Xiaosong Wu

    • Georgia Tech
  • Yike Wu

    • Georgia Tech
  • Ming Ruan

    • Georgia Tech
  • Nerasoa K. Madiomanana

    • Georgia Tech
  • John Hankinson

    • Georgia Tech
  • Mike Sprinkle

    • Georgia Tech
  • Benjamin Piot

    • CNRS- LNCMI, France
  • Clement Faugeras

    • CNRS- LNCMI, France
  • Marek Potemski

    • CNRS- LNCMI, France
  • Walt A. de Heer

    • Georgia Tech