Probing the Electronic Structure of Chalcogen Ultra-doped Silicon
ORAL
Abstract
Chalcogen impurity atoms in silicon have been shown to introduce deep energy levels within the bandgap. Absorption coupled to these defect levels could account for the enhanced sub-bandgap absorption. We will report on the methods and preliminary results of measuring the absorption coefficient in the isolated S-doped layer. Additionally, we use x-ray spectroscopy to probe the electronic properties of the material, and to understand the specific role that dopant states play in enhanced absorption.
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Authors
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Joseph T. Sullivan
Massachusetts Institute of Technology
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Bonna Newman
Massachusetts Institute of Technology
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Tonio Buonassis
Massachusetts Institute of Technology, MIT