Patterning of Multiple Block Copolymers per Layer with Orthogonal Processing

In this work we demonstrate the concept of orthogonal processing of block copolymers. By using a semi-flourinated photoresist/solvent system, we are able to selectively pattern or lift-off and then recover the block copolymer film intact. This approach can enable removable templating of self- assembly and also multiple block copolymers, morphologies or domain sizes on the same layer which can open the door to self-assembly of a wider range of geometries than possible before. We highlight the interplay between the various parameters for a successful additive and subtractive patterning and directions for further theoretical investigation as well as the limitations of this technique.