Stress induced topographic patterning in thin diblock copolymer films
ORAL
Abstract
When a thin rigid polymer film is attached to a soft elastic substrate and placed in a state of compressive stress, the system wrinkles as a critical stress is surpassed. This simple deformation pattern contains information about the mechanical state of both the polymer film and substrate. Although classical mechanics can be used to relate the global deformation of the film/substrate to the local wrinkle geometry as a function of materials properties, relatively little is known about how the thin capping film material accommodates the localized bending (and therefore localized stress). Here we conduct wrinkling experiments using a model diblock copolymer/elastomer composite. Wrinkling a homogeneous, disordered block copolymer film places the film in a well-defined initial stress state. When heated above its glass transition, the wrinkled film flows, microphase separates, and relaxes from the stress imposed by local wrinkle deformations. The periodic stress relaxation leads to the emergence of a new pattern in the microphase separated surface structure, thus providing new insight into how block copolymers react to stress.
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Authors
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Andrew Croll
North Dakota State University
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Al Crosby
University of Massachusetts Amherst, University of Massachusetts, University of Massachusetts, Amherst, University of Massachusetts--Amherst