Thermoelectric Performance of Hole-Doped Cu$_2$O
ORAL
Abstract
We present an analysis of the thermopower and related properties of hole-doped Cu$_2$O using first-principles calculations and Boltzmann transport theory. Our results show that hole-doped Cu$_2$O has a high thermopower of above 200 $\mu$V/K with doping levels as high as 5.5 $\times$ 10$^{20}$ cm$^{-3}$ at 500 K, mainly attributed to the heavy valence bands of Cu$_2$O. The current theory suggests that hole-doped Cu$_2$O could be a good thermoelectric material. Future experiments are thus suggested to explore its thermoelectric potential for practical use in cooling and power generation applications.
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Authors
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Xin Chen
Oak Ridge National Laboratory
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David Parker
ORNL, Oak Ridge National Laboratory, Oak Ridge National Laboratory, 1 Bethel Valley Road, Oak Ridge, Tennessee 37831
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Mao-Hua Du
Oak Ridge National Laboratory, Oak Ridge National Lab
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David Singh
Oak Ridge National Laboratory, ORNL, Materials Science and Engineering Division Oak Ridge National Laboratory