Thermoelectric Performance of Hole-Doped Cu$_2$O

ORAL

Abstract

We present an analysis of the thermopower and related properties of hole-doped Cu$_2$O using first-principles calculations and Boltzmann transport theory. Our results show that hole-doped Cu$_2$O has a high thermopower of above 200 $\mu$V/K with doping levels as high as 5.5 $\times$ 10$^{20}$ cm$^{-3}$ at 500 K, mainly attributed to the heavy valence bands of Cu$_2$O. The current theory suggests that hole-doped Cu$_2$O could be a good thermoelectric material. Future experiments are thus suggested to explore its thermoelectric potential for practical use in cooling and power generation applications.

Authors

  • Xin Chen

    Oak Ridge National Laboratory

  • David Parker

    ORNL, Oak Ridge National Laboratory, Oak Ridge National Laboratory, 1 Bethel Valley Road, Oak Ridge, Tennessee 37831

  • Mao-Hua Du

    Oak Ridge National Laboratory, Oak Ridge National Lab

  • David Singh

    Oak Ridge National Laboratory, ORNL, Materials Science and Engineering Division Oak Ridge National Laboratory