Controlling organic magnetoresistance via interface engineering
ORAL
Abstract
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Authors
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C.A. Richter
Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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H.-J. Jang
Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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S.J. Pookpanratana
Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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J.I. Basham
National Institute of Standards and Technology, Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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C.A. Hacker
Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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O.A. Kirillov
Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899
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R.J. Kline
Materials Sci and Eng Div, NIST, Gaithersburg, MD 20899
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O.D. Jurchescu
Dept of Physics, Wake Forest Univ. Winston-Salem, NC 27109
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D.J. Gundlach
National Institute of Standards and Technology, Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD 20899