Modification of 2D Silica Bilayer Structure via Strain and Al Doping

ORAL

Abstract

The preparation of 2D silicate bilayers on metal substrates in crystalline and amorphous forms paves the way to creating a multitude of 2D structures. We study strain effects on the bilayer structure using Ni$_{x}$Pd$_{1-x}$(111) films which allow continuous strain tuning from 6.0{\%} compressive to 3.8{\%} tensile. The interaction with the substrate and its atomic spacing and geometry determines the lattice strain exerted. Previously, a commensurate hexagonal crystalline bilayer was observed on Ru(0001) with a tensile mismatch of 2.2{\%}, while only amorphous bilayers were seen on Pt(111) (4.7{\%} tensile mismatch) and uniaxial strain on Pd(100) led to a commensurate crystalline phase with arrays of domain boundaries. Theory indicates that biaxial tensile strain above 2.5{\%} favors the introduction of 8-membered rings into the bilayer. Experiments show that SiO$_{2}$ bilayers grow in an incommensurate crystalline form on Pd(111) (x$=$0) which sets the maximum biaxial tensile strain to \textless 3.8{\%}. Meanwhile, AlSi$_{3}$O$_{8}$ thin films formed a commensurate crystalline film on Pd(111). Theory shows that the longer Al-O bonds reduce the strain energy by decreasing the mismatch to 1.9{\%}, explaining the transition from incommensurate to commensurate. Ongoing work on Ni$_{x}$Pd$_{1-x}$(111) is determining the maximum lattice strain that can be applied for controllable introduction of 8-membered rings into the structure.

Authors

  • Chao Zhou

    Yale Univ, Yale University

  • Jin-Hao Jhang

    Yale Univ

  • Gregory Hutchings

    Yale Univ

  • Omur Dagdeviren

    Yale Univ, Yale University

  • Andrei Malashevich

    Yale Univ

  • Udo Schwarz

    Yale Univ, Yale University

  • Sohrab Ismail-Beigi

    Department of Applied Physics, Yale University, Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, Yale Univ, Yale University

  • Eric Altman

    Center for Research on Interface Structures and Phenomena and Department of Chemical & Environmental Engineering, Yale University, Yale Univ, Yale University