Optospintronics in graphene via proximity coupling

ORAL

Abstract

Observation of micron size spin relaxation lengths makes graphene an ideal material for spintronics applications. However, spin dependent scattering at the contact/graphene interfaces causes low spin injection efficiencies. An attractive solution would be employing optical spin injection schemes but the tiny spin orbit coupling and low optical absorption of graphene is a hurdle.
In this talk, we will discuss our attempts on optical spin injection into graphene by utilizing monolayer WSe2’s spin-coupled valley-selective absorption property. Towards this, we fabricate heterostructure devices consisting of monolayer WSe2, monolayer graphene and three layers of h-BN. A circularly polarized light is applied to selectively populate one of the valleys in the WSe2 layer. This produces spin polarized excitons consisting of holes and electrons. The latter diffuses into the graphene layer and causes spin accumulation. This spin accumulation is detected by using h-BN tunnel barrier/Co electrodes. We exclude any spurious effects by prudently studying the separation, power intensity and incident light polarization dependences on the non-local signal. We also compare the non-local signals generated by the monolayer and bilayer WSe2 to prove its valleytronic origin.

Presenters

  • Ahmet Avsar

    Ecole polytechnique fédérale de Lausanne

Authors

  • Ahmet Avsar

    Ecole polytechnique fédérale de Lausanne

  • Dmitrii Unuchek

    EPFL, Ecole polytechnique fédérale de Lausanne

  • Jiawei Liu

    National University of Singapore

  • Oriol Lopez Sanchez

    Ecole polytechnique fédérale de Lausanne

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Barbaros Özyilmaz

    National University of Singapore

  • Andras Kis

    Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne, EPFL, Ecole polytechnique fédérale de Lausanne